By Chris A. Mack

ISBN-10: 0819462071

ISBN-13: 9780819462077

The cloth during this box advisor is a distillation of fabric prepare through Chris Mack over the last twenty years, together with notes from his graduate-level lithography path on the college of Texas at Austin. This box advisor information the lithography procedure, picture formation, imaging onto a photoresist, photoresist chemistry, and lithography keep an eye on and optimization. An advent to next-generation lithographic applied sciences can be integrated, in addition to an in depth lithography thesaurus and a summation of salient equations severe to a person interested in the lithography industry.

Contents

- image thesaurus
- The Lithgraphy approach
- picture Formation
- Imaging right into a Photoresist
- Photoresist Chemistry
- Lithography keep watch over and Optimization
- Equation precis
- word list
- Index

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Extra resources for Field Guide to Optical Lithography

Sample text

Finally, the bottom example shows an intermediate case. Working through the trigonometry of the vector sum shows that the portion of the two vectors that overlap will interfere, and the portion of the vectors that are at right angles will add in quadrature. For two plane waves approaching the wafer, the transverse electric or TE fields (the electric field pointing out of the page of the drawing) are always 100% overlapped regardless of the angle between the plane waves. For the transverse magnetic or TM field (the electric field pointing in the page of the drawing), the extent of overlap between the two vectors grows smaller as the angle between the plane waves grows larger.

If one angle of illumination causes a shift in the diffraction pattern, a range of angles will cause a range of shifts, resulting in broadened diffraction orders. One can characterize the range of angles used for the illumination in several ways, but the most common is the partial coherence factor σ (also called the degree of partial coherence, the pupil-filling function, or just the partial coherence). The partial coherence is defined as the sine of the half-angle of the illumination cone divided by the objective lens numerical aperture.

Thus, adjusting the tilt of the illumination to improve printing will be pitch dependent. Image Formation 19 Partial Coherence Light arriving at the mask from only one angle is called coherent illumination. If the illumination of the mask is composed of light coming from a range of angles, the illumination is called partially coherent. If one angle of illumination causes a shift in the diffraction pattern, a range of angles will cause a range of shifts, resulting in broadened diffraction orders.

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Field Guide to Optical Lithography by Chris A. Mack


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